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Low temperature dielectric relaxations in ZnO varistor

Author/Creator: Τσώνος, Χρήστος; Καναπίτσας, Αθανάσιος; Τριάντης, Δήμος Α.; Αναστασιάδης, Κίμων; Σταύρακας, Ηλίας

Publication Date: 2010
Electron beam lithography simulation for the patterning of extreme ultraviolet masks

Author/Creator: Τσικρικάς, Ν.; Πάτσης, Γεώργιος; Ράπτης, Ιωάννης; Gerardino, Annamaria; Quesnel, E.

Publication Date: 2008
Stochastic simulation of material and process effects on the patterning of complex layouts

Author/Creator: Τσικρικάς, Ν.; Δρυγιαννάκης, Δ.; Πάτσης, Γεώργιος; Ράπτης, Ιωάννης; Σταυρουλάκης, Σ.

Publication Date: 2007-09-20
Effects of photoresist polymer molecular weight and acid-diffusion on line-edge roughness

Author/Creator: Πάτσης, Γεώργιος; Γογγολίδης, Ευάγγελος; vanWerden, K.

Publication Date: 2005-08-05
A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models

Author/Creator: Σαρρής, Β.; Πάτσης, Γεώργιος; Κωνσταντούδης, Βασίλειος; Μπουντούβης, Ανδρέας; Γογγολίδης, Ευάγγελος

Publication Date: 2005-10-11

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