http://hypatia.teiath.gr/xmlui/handle/11400/8625Stochastic modeling and simulation of photoresist surface and line-edge roughness evolution

dc.contributor.author	Πάτσης, Γεώργιος	el
dc.contributor.author	Δρυγιαννάκης, Δ.	el
dc.contributor.author	Κωνσταντούδης, Βασίλειος	el
dc.contributor.author	Ράπτης, Ιωάννης	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.date.accessioned	2015-05-16T17:59:07Z
dc.date.available	2015-05-16T17:59:07Z
dc.date.issued	2015-05-16
dc.identifier.uri	http://hdl.handle.net/11400/10545
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.sciencedirect.com	en
dc.source	http://www.sciencedirect.com/science/article/pii/S0014305710002533	en
dc.subject	Macromolecular nanotechnology
dc.subject	Μακρομοριακή νανοτεχνολογία
dc.subject	Photoresist surface
dc.subject	Επιφάνεια φωτοαντίστατης
dc.title	Stochastic modeling and simulation of photoresist surface and line-edge roughness evolution	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electronics
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρονική
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρονική
heal.identifier.secondary	DOI: http://dx.doi.org/10.1016/j.eurpolymj.2010.07.002
heal.language	en
heal.access	campus
heal.publicationDate	2010-10
heal.bibliographicCitation	Patsis, G., Drygiannakis, D., Constantoudis, V., Raptis, I. and Gogolides, E. (2010) Stochastic modeling and simulation of photoresist surface and line-edge roughness evolution. "European Polymer Journal", 46 (10), p.1988–1999	en
heal.abstract	Polymeric photosensitive materials due to their vital role as imaging films in lithography should have low line-edge roughness (LER) in order to assist in continuous device shrinking. Through stochastic 2 dimensional simulations, it is indicated that a dissolving polymer film exhibits self-affine characteristics. Its surface roughness (SR) evolution is investigated using a dynamic dissolution algorithm based on critical ionization model. LER is studied with a fast quasi-static dissolution algorithm. Investigation of self-affine properties of both SR and LER has been performed in terms of degree of polymerization, chain architecture, and critical ionization fraction. No base diffusion and acid–base neutralization was considered in the study.	en
heal.publisher	Elsevier	en
heal.journalName	European Polymer Journal	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	false