High resolution patterning and simulation on Mo/Si multilayer for EUV masks

dc.contributor.author	Τσικρικάς, Ν.	el
dc.contributor.author	Πάτσης, Γεώργιος	el
dc.contributor.author	Ράπτης, Ιωάννης	el
dc.contributor.author	Gerardino, Annamaria	el
dc.date.accessioned	2015-05-17T17:01:45Z
dc.date.issued	2015-05-17
dc.identifier.uri	http://hdl.handle.net/11400/10601
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://proceedings.spiedigitallibrary.org	en
dc.subject	Electron beams
dc.subject	Ultraviolet rays
dc.subject	Δέσμες ηλεκτρονίων
dc.subject	Υπεριώδεις ακτίνες
dc.subject	Metrology
dc.subject	Μετρολογία
dc.title	High resolution patterning and simulation on Mo/Si multilayer for EUV masks	en
heal.type	conferenceItem
heal.classification	Technology
heal.classification	Electronics
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρονική
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρονική
heal.identifier.secondary	DOI: 10.1117/12.798804
heal.dateAvailable	10000-01-01
heal.language	en
heal.access	forever
heal.publicationDate	2008-01-21
heal.bibliographicCitation	Tsikrikas, N., Patsis, G., Raptis, I. and Gerardino, A. (2008) High resolution patterning and simulation on Mo/Si multilayer for EUV masks. In 24th European Mask and Lithography Conference. 21st January 2008. Dresden	en
heal.abstract	Electron Beam writing process is essential for EUV mask manufacturing and direct writing. Electron beam lithography simulation tools can provide critical information in the way of obtaining high accuracy results. In the present work a software tool which performs e-beam writing simulation, resist development simulation and automated metrology has been developed and applied in the case of Mo/Si multilayer substrates. Simulation results are compared with experimental ones in order to evaluate the simulation's accuracy.	en
heal.publisher	SPIE	en
heal.fullTextAvailability	false
heal.conferenceName	24th European Mask and Lithography Conference	en
heal.conferenceItemType	poster