Molecular weight and processing effects on the dissolution properties of thin poly(methyl methacrylate) films

dc.contributor.author	Κοκκίνης, Α.	el
dc.contributor.author	Βαλαμόντες, Ευάγγελος Σ.	el
dc.contributor.author	Γουστουρίδης, Δημήτριος	el
dc.contributor.author	Γκανέτσος, Θεόδωρος	el
dc.contributor.author	Μπέλτσιος, Κωνσταντίνος Γ.	el
dc.date.accessioned	2015-05-17T19:05:40Z
dc.date.available	2015-05-17T19:05:40Z
dc.date.issued	2015-05-17
dc.identifier.uri	http://hdl.handle.net/11400/10620
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.elsevier.com	en
dc.subject	Dissolution
dc.subject	Lithography
dc.subject	Multiwavelength interferometry
dc.subject	Poly(methyl methacrylate)
dc.subject	Thin film
dc.subject	Λεπτό φιλμ
dc.subject	Διάλυση
dc.subject	Λιθογραφία
dc.title	Molecular weight and processing effects on the dissolution properties of thin poly(methyl methacrylate) films	en
heal.type	journalArticle
heal.classification	Science
heal.classification	Physics
heal.classification	Επιστήμες
heal.classification	Φυσική
heal.classificationURI	http://zbw.eu/stw/descriptor/15685-2
heal.classificationURI	http://zbw.eu/stw/descriptor/15669-0
heal.classificationURI	N/A-Επιστήμες
heal.classificationURI	N/A-Φυσική
heal.contributorName	Ράπτης, Ιωάννης Α.	el
heal.identifier.secondary	DOI: 10.1016/j.mee.2007.04.141
heal.language	en
heal.access	campus
heal.publicationDate	2008-01
heal.bibliographicCitation	KOKKINIS, A., VALAMONTES, E.S., GOUSTOURIDIS, D., GANETSOS, T., BELTSIOS, K.G., et al. (2008). Molecular weight and processing effects on the dissolution properties of thin poly(methyl methacrylate) films. Microelectronic Engineering. [online] 85 (1). p. 93-99. Available from: http://www.elsevier.com/[Accessed 29/04/2007]	en
heal.abstract	An experimental set-up based on multiwavelength interferometry, is applied in order to study in-situ the dissolution process of thin resist films. The interference function was the basis for a fitting algorithm, which analyses the experimental data and evaluates the progress of the resist thickness with time. The dissolution of various PMMA molecular weights (15 K, 350 K, 996 K) and resist thicknesses (20-300 nm), in various developers, consisting of mixtures of methyl iso butyl ketone (MIBK), iso propanol (IPA), H2O at various relative concentrations, was studied. Surface dissolution inhibition was shown in unexposed resists with high molecular weights and increased thickness in the case of MIBK-IPA 1-1 and IPA-H2O 7-3 developers. After that the whole dissolution process evolved at a steady rate. Dissolution of thick films proved to be unpredictable showing complex dissolution curves. Low molecular weight resists presented a smooth dissolution curve without dissolution inhibition. Samples exposed with small DUV doses, exhibited dissolution behavior similar to the unexposed cases, whereas high exposure doses, within the lithographically useful range, led to smooth dissolution behavior. In the case of MIBK-IPA 1-3 developer significant swelling was observed.	en
heal.publisher	Elsevier	en
heal.journalName	Microelectronic Engineering	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true