dc.contributor.author | Βαλαμόντες, Ευάγγελος Σ. | el |
dc.contributor.author | Σταθαράς, Ιωάννης Χ. | el |
dc.contributor.author | Νομικός, Κωνσταντίνος Δ. | el |
dc.date.accessioned | 2015-05-17T19:56:46Z | |
dc.date.available | 2015-05-17T19:56:46Z | |
dc.date.issued | 2015-05-17 | |
dc.identifier.uri | http://hdl.handle.net/11400/10624 | |
dc.rights | Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
dc.source | http://www.elsevier.com | en |
dc.subject | Electron probe microanalysis | |
dc.subject | Fluorescence microscopy | |
dc.subject | Scanning electron microscopy | |
dc.subject | Μικροανάλυση ανιχνευτή ηλεκτρονίων | |
dc.subject | Μικροσκόπιο φθορισμού | |
dc.subject | Σάρωση ηλεκτρονικής μικροσκοπίας | |
dc.title | Scanning X-ray microfluorescence in a SEM for the analysis of very thin overlayers | en |
heal.type | journalArticle | |
heal.classification | Technology | |
heal.classification | Electrical engineering | |
heal.classification | Τεχνολογία | |
heal.classification | Ηλεκτρολογία Μηχανολογία | |
heal.classificationURI | http://id.loc.gov/authorities/subjects/sh85133147 | |
heal.classificationURI | http://zbw.eu/stw/descriptor/18426-4 | |
heal.classificationURI | **N/A**-Τεχνολογία | |
heal.classificationURI | **N/A**-Ηλεκτρολογία Μηχανολογία | |
heal.keywordURI | http://id.loc.gov/authorities/subjects/sh85042233 | |
heal.keywordURI | http://id.loc.gov/authorities/subjects/sh85049410 | |
heal.keywordURI | http://id.loc.gov/authorities/subjects/sh91002757 | |
heal.identifier.secondary | DOI: 10.1016/j.nimb.2007.03.089 | |
heal.language | en | |
heal.access | campus | |
heal.publicationDate | 2007-07 | |
heal.bibliographicCitation | VALAMONTES, E.S., STATHARAS, I.C. & NOMICOS, C.D. (2007). Scanning X-ray microfluorescence in a SEM for the analysis of very thin overlayers. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. [online] 260 (2). p. 628-632. Available from: http://www.elsevier.com/[Accessed 07/04/2007] | en |
heal.abstract | In this paper, we used back-foil scanning X-ray microfluorescence (SXRF) and we examined the sensitivity of the technique for the analysis of very thin overlayers, where electron probe X-ray microanalysis (EPMA) reaches its detection limits. The lateral resolution of back-foil SXRF is also calculated for all the systems used. Both experimental results and Monte-Carlo calculations are used in this respect. Back-foil SXRF used in optimized experimental conditions, is found to be more sensitive than EPMA, especially in the case of very thin overlayers. The lateral resolution of back-foil SXRF is of the order of some micrometers. This is much better than the lateral resolution in conventional XRF and of the same order of magnitude as in EPMA. | en |
heal.publisher | Elsevier | en |
heal.journalName | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | en |
heal.journalType | peer-reviewed | |
heal.fullTextAvailability | true |
Οι παρακάτω άδειες σχετίζονται με αυτό το τεκμήριο: