Fractal roughness of polymers after lithographic processing

dc.contributor.author	Κωνσταντούδης, Βασίλειος	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.contributor.author	Πάτσης, Γεώργιος Π.	el
dc.contributor.author	Σαρρής, Βασίλειος	el
dc.contributor.author	Τσερέπη, Αγγελική Δ.	el
dc.date.accessioned	2015-05-18T17:35:20Z
dc.date.available	2015-05-18T17:35:20Z
dc.date.issued	2015-05-18
dc.identifier.uri	http://hdl.handle.net/11400/10683
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	https://www.jsap.or.jp/	en
dc.subject	Fractal surfaces
dc.subject	Lithography
dc.subject	Monte-Carlo simulation
dc.subject	Photoresists
dc.subject	Polymer dissolution
dc.subject	roughness
dc.subject	Self-affinity
dc.subject	Stochastic simulation
dc.subject	Λιθογραφία
dc.subject	Προσομοίωση Monte-Carlo
dc.subject	Φωτοαντιστάτης
dc.subject	Πολυμερής διάλυση
dc.subject	Τραχύτητα
dc.subject	Στοχαστική προσομοίωση
dc.title	Fractal roughness of polymers after lithographic processing	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electrical engineering
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρολογία Μηχανολογία
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://zbw.eu/stw/descriptor/18426-4
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρολογία Μηχανολογία
heal.keywordURI	http://id.loc.gov/authorities/subjects/sh85101409
heal.keywordURI	http://lod.nal.usda.gov/58057
heal.contributorName	Διακουμάκος, Κωνσταντίνος Δ.	el
heal.contributorName	Βαλαμόντες, Ευάγγελος Σ.	el
heal.identifier.secondary	DOI: 10.1143/JJAP.44.L186
heal.language	en
heal.access	campus
heal.publicationDate	2005
heal.bibliographicCitation	CONSTANTOUDIS, V., GOGOLIDES, E., PATSIS, G.P., SARRIS, V., TSEREPI, A.D., et al. (2005). Fractal roughness of polymers after lithographic processing. Japanese Journal of Applied Physics, Part 2: Letters. [online] 44 (1-7). p. L186-L189. Available from: http://www.jsap.or.jp/	en
heal.abstract	The morphology of photoresist polymer surfaces fabricated by lithographic processes is shown to exhibit self-affine behavior for a specific range of scales. The roughness parameters appropriate for the characterization of self-affine surfaces (surface width ω, correlation length χ and roughness exponent α) are found to depend on the exposure dose (i.e. the solubility) involved in the lithography process and to be correlated. A similar dependence and correlation is extracted from a Monte-Carlo simulation of polymer dissolution, thus indicating the pronounced contribution of the dissolution process to the formation of lithographic roughness. The self-affinity and the correlated behavior of the roughness parameters is a general phenomenon for dissolving polymers of varying solubility and not limited to the lithographic process.	en
heal.publisher	Japan Society of Applied Physics	en
heal.journalName	Japanese Journal of Applied Physics, Part 2: Letters	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true