Proton beam micromachining on strippable aqueous base developable negative resist

dc.contributor.author	Rajta, István	en
dc.contributor.author	Baradács, Eszter	en
dc.contributor.author	Χατζηχρηστίδη, Μαργαρίτα	el
dc.contributor.author	Βαλαμόντες, Ευάγγελος Σ.	el
dc.contributor.author	Uzonyi, Imre	en
dc.date.accessioned	2015-05-18T17:49:50Z
dc.date.available	2015-05-18T17:49:50Z
dc.date.issued	2015-05-18
dc.identifier.uri	http://hdl.handle.net/11400/10686
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.elsevier.com	en
dc.subject	Epoxy and polystyrene based chemically amplified polymer resists
dc.subject	High aspect ratio technologies
dc.subject	Proton beam micromachining
dc.subject	Τεχνολογίες με υψηλή αναλογία διαστάσεων
dc.subject	Μικρομηχανική ακτίνα πρωτονίου
dc.title	Proton beam micromachining on strippable aqueous base developable negative resist	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electrical engineering
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρολογία Μηχανολογία
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://zbw.eu/stw/descriptor/18426-4
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρολογία Μηχανολογία
heal.contributorName	Ράπτης, Ιωάννης Α.	el
heal.identifier.secondary	DOI: 10.1016/j.nimb.2005.01.094
heal.language	en
heal.access	campus
heal.publicationDate	2005-04
heal.bibliographicCitation	RAJTA, I., BARADACS, E., CHATZICHRISTIDI, M., VALAMONTES, E.S., UZONYI, I., et al. (2005). Proton beam micromachining on strippable aqueous base developable negative resist. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. [online] 231 (1-4). p. 423-427. Available from: http://www.elsevier.com[Accessed 17/03/2005]	en
heal.abstract	Nowadays a significant amount of research effort is devoted to the development of technologies for the fabrication of microcomponents and microsystems worldwide. In certain applications of micromachining high aspect ratio (HAR) structures are required. However, the resist materials used in HAR technologies are usually not compatible with the IC fabrication, either because they cannot be stripped away or because they are developed in organic solvents. In the present work the application of a novel chemically amplified resist for proton beam micromachining is presented. The resist based on epoxy and polyhydroxystyrene polymers is developed in the IC standard aqueous developers. The exposed areas can be stripped away using conventional organic stripping solutions. In order to test the exposure dose sensitivity and the lateral resolution, various test structures were irradiated. Using this formulation 5-8 μm wide lines with aspect ratio 4-6 were resolved.	en
heal.publisher	Elsevier	en
heal.journalName	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true