Dissolution properties of ultrathin photoresist films with multiwavelength interferometry

dc.contributor.author	Κοκκίνης, Α.	el
dc.contributor.author	Βαλαμόντες, Ευάγγελος Σ.	el
dc.contributor.author	Ράπτης, Ιωάννης Α.	el
dc.date.accessioned	2015-05-18T18:58:17Z
dc.date.available	2015-05-18T18:58:17Z
dc.date.issued	2015-05-18
dc.identifier.uri	http://hdl.handle.net/11400/10696
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://iopscience.iop.org/	en
dc.subject	Algorithm
dc.subject	Interference function
dc.subject	Molecular weight
dc.subject	Αλγόριθμος
dc.subject	Λειτουργία παρεμβολής
dc.subject	Μοριακό βάρος
dc.title	Dissolution properties of ultrathin photoresist films with multiwavelength interferometry	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electrical engineering
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρολογία Μηχανολογία
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://zbw.eu/stw/descriptor/18426-4
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρολογία Μηχανολογία
heal.identifier.secondary	DOI: 10.1088/1742-6596/10/1/098
heal.language	en
heal.access	campus
heal.publicationDate	2005-01-01
heal.bibliographicCitation	KOKKINIS, A., VALAMONTES, E.S. & RAPTIS, I.A. (2005). Dissolution properties of ultrathin photoresist films with multiwavelength interferometry. Journal of Physics: Conference Series. [online] 10 (1). p. 401-404. Available from: http://iopscience.iop.org/	en
heal.abstract	According to the ITRS, a significant decrease in lateral resolution and thickness of resists is anticipated for the forthcoming decade. In order to study in-situ the dissolution of thin resist films, a set-up based on multiwavelength interferometry was developed. Using this setup and an appropriate fitting algorithm, based on the interference function, the resist thickness vs. time is calculated. In the present work, the dissolution of PMMA in a 20-300 nm thickness range is studied. First results showed that in the case of ultra thin films of high molecular weights, dissolution proceeds smoothly after an initial surface inhibition period while thicker films present a more complex dissolution curve. In the case of low molecular weight (15K) the surface inhibition period is negligible and dissolution proceeds smoothly for the whole thickness range examined. PMMA films exposed with various DUV doses exhibit similar behavior with the unexposed films in terms of dissolution inhibition.	en
heal.publisher	IOP Publishing	en
heal.journalName	Journal of Physics: Conference Series	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true