Surface roughness induced by plasma etching of si-containing polymers

dc.contributor.author	Τσερέπη, Αγγελική Δ.	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.contributor.author	Κωνσταντούδης, Βασίλειος	el
dc.contributor.author	Κορδογιάννης, Γεώργιος	el
dc.contributor.author	Ράπτης, Ιωάννης Α.	el
dc.date.accessioned	2015-05-18T19:20:30Z
dc.date.issued	2015-05-18
dc.identifier.uri	http://hdl.handle.net/11400/10700
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.tandfonline.com/	en
dc.subject	Bilayer resists
dc.subject	Plasma treatment
dc.subject	Silicon-containing polymers
dc.subject	Surface roughness
dc.subject	Επιφανειακή τραχύτητα
dc.subject	Ανθεκτική Διστοιβάδα
dc.subject	Επεξεργασία πλάσματος
dc.subject	Πολυμερή που περιέχουν πυρίτιο
dc.title	Surface roughness induced by plasma etching of si-containing polymers	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Chemical technology
heal.classification	Τεχνολογία
heal.classification	Χημική τεχνολογία
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://skos.um.es/unescothes/C00565
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Χημική τεχνολογία
heal.keywordURI	http://id.loc.gov/authorities/subjects/sh85130724
heal.contributorName	Βαλαμόντες, Ευάγγελος Σ.	el
heal.identifier.secondary	DOI: 10.1163/156856103322113805
heal.dateAvailable	10000-01-01
heal.language	en
heal.access	forever
heal.publicationDate	2003
heal.bibliographicCitation	TSEREPI, A.D., GOGOLIDES, E., CONSTANTOUDIS, V., CORDOYIANNIS, G., RAPTIS, I.A., et al. (2003). Surface roughness induced by plasma etching of si-containing polymers. Journal of Adhesion Science and Technology. [online] 17 (8). p. 1083-1091. Available from: http://www.tandfonline.com/[Accessed 02/04/2012]	en
heal.abstract	Interfacial properties of polymers and their control become important at submicrometer scales, as polymers find widespread applications in industries ranging from micro- and nano-electronics to optoelectronics and others fields. In this work, we address the issue of controlled modification of surface topography of Si-containing polymers when subjected to oxygen-based plasma treatments. Treated surfaces were examined by atomic force microscopy to obtain surface topography and roughness of plasma-treated surfaces. Our experimental results indicate that an appropriate optimization of plasma chemistry and processing conditions allows, on one hand, small values of surface roughness, a result crucial for the potential use of these polymers for sub-100 nm lithography, and, on the other hand, desirable topography, applicable for example in sensor devices. Plasma processing conditions can be modified to result either in smooth surfaces (rms roughness < 1 nm) or in periodic structures of controlled roughness size and periodicity.	en
heal.publisher	Taylor & Francis	en
heal.journalName	Journal of Adhesion Science and Technology	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true