Show simple item record

dc.contributor.author Γογγολίδης, Ευάγγελος el
dc.contributor.author Κωνσταντούδης, Βασίλειος el
dc.contributor.author Πάτσης, Γεώργιος el
dc.contributor.author Τσερέπη, Αγγελική el
dc.date.accessioned 2015-05-18T19:50:18Z
dc.date.available 2015-05-18T19:50:18Z
dc.date.issued 2015-05-18
dc.identifier.uri http://hdl.handle.net/11400/10707
dc.rights Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.source http://www.sciencedirect.com en
dc.source http://www.sciencedirect.com/science/article/pii/S0167931706002292 en
dc.subject Νανοτεχνολογία
dc.subject Material processing
dc.subject LER
dc.subject Nanotechnology
dc.subject Επεξεργασία υλικού
dc.title A review of line edge roughness and surface nanotexture resulting from patterning processes en
heal.type journalArticle
heal.classification Technology
heal.classification Electronics
heal.classification Τεχνολογία
heal.classification Ηλεκτρονική
heal.classificationURI http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI **N/A**-Τεχνολογία
heal.classificationURI **N/A**-Ηλεκτρονική
heal.identifier.secondary DOI: 10.1016/j.mee.2006.01.162
heal.language en
heal.access campus
heal.publicationDate 2006-04
heal.bibliographicCitation Gogolides, E., Constantoudis, V., Patsis, G. and Tserepi, A. (2006) A review of line edge roughness and surface nanotexture resulting from patterning processes. "Microelectronic Engineering", 83 (4-9), p.1067–1072 en
heal.abstract The importance of surface and sidewall roughness in nanotechnology is discussed and a roughness study framework is presented. The framework is based on the interaction triangle: application, characterization and material processing. An overview of roughness characterization and metrology as well as line edge roughness (LER) resulting from nanolithography is presented. Examples of plasma induced roughness and nanotexturing are given for polydimethylsiloxane and silicon surfaces. en
heal.publisher Elsevier en
heal.journalName Microelectronic Engineering en
heal.journalType peer-reviewed
heal.fullTextAvailability false


Files in this item

Files Size Format View

There are no files associated with this item.

The following license files are associated with this item:

This item appears in the following Collection(s)

Show simple item record

Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες Except where otherwise noted, this item's license is described as Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες