A review of line edge roughness and surface nanotexture resulting from patterning processes

dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.contributor.author	Κωνσταντούδης, Βασίλειος	el
dc.contributor.author	Πάτσης, Γεώργιος	el
dc.contributor.author	Τσερέπη, Αγγελική	el
dc.date.accessioned	2015-05-18T19:50:18Z
dc.date.available	2015-05-18T19:50:18Z
dc.date.issued	2015-05-18
dc.identifier.uri	http://hdl.handle.net/11400/10707
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.sciencedirect.com	en
dc.source	http://www.sciencedirect.com/science/article/pii/S0167931706002292	en
dc.subject	Νανοτεχνολογία
dc.subject	Material processing
dc.subject	LER
dc.subject	Nanotechnology
dc.subject	Επεξεργασία υλικού
dc.title	A review of line edge roughness and surface nanotexture resulting from patterning processes	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electronics
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρονική
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρονική
heal.identifier.secondary	DOI: 10.1016/j.mee.2006.01.162
heal.language	en
heal.access	campus
heal.publicationDate	2006-04
heal.bibliographicCitation	Gogolides, E., Constantoudis, V., Patsis, G. and Tserepi, A. (2006) A review of line edge roughness and surface nanotexture resulting from patterning processes. "Microelectronic Engineering", 83 (4-9), p.1067–1072	en
heal.abstract	The importance of surface and sidewall roughness in nanotechnology is discussed and a roughness study framework is presented. The framework is based on the interaction triangle: application, characterization and material processing. An overview of roughness characterization and metrology as well as line edge roughness (LER) resulting from nanolithography is presented. Examples of plasma induced roughness and nanotexturing are given for polydimethylsiloxane and silicon surfaces.	en
heal.publisher	Elsevier	en
heal.journalName	Microelectronic Engineering	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	false