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dc.contributor.author Σαρρής, Β. el
dc.contributor.author Πάτσης, Γεώργιος el
dc.contributor.author Κωνσταντούδης, Βασίλειος el
dc.contributor.author Μπουντούβης, Ανδρέας el
dc.contributor.author Γογγολίδης, Ευάγγελος el
dc.date.accessioned 2015-05-18T22:14:56Z
dc.date.available 2015-05-18T22:14:56Z
dc.date.issued 2015-05-19
dc.identifier.uri http://hdl.handle.net/11400/10719
dc.rights Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.source http://iopscience.iop.org en
dc.source http://iopscience.iop.org/1347-4065/44/10R/7400?fromSearchPage=true en
dc.subject Molecular weight
dc.subject Μοριακό βάρος
dc.subject Φωτοαντίσταση
dc.subject Photoresistance
dc.subject Polymerization
dc.subject Πολυμερισμός
dc.title A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models en
heal.type journalArticle
heal.classification Technology
heal.classification Electronics
heal.classification Τεχνολογία
heal.classification Ηλεκτρονική
heal.classificationURI http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI **N/A**-Τεχνολογία
heal.classificationURI **N/A**-Ηλεκτρονική
heal.identifier.secondary DOI: 10.1143/JJAP.44.7400
heal.language en
heal.access free
heal.publicationDate 2005-10-11
heal.bibliographicCitation Sarris, V., Patsis, G., Constantoudis, V., Boudouvis, A. and Gogolides, E. (2005) A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models. "Japanese Journal of Applied Physics", 44 (10) en
heal.tableOfContents A new model for photoresist-polymer dissolution in aqueous base is presented combining the critical ionization model [P. C. Tsiartas et al.: Macromolecules 30 (1992) 4656] and the percolation model [A. Reiser et al.: Angew. Chem., Int. Ed. 35 (1996) 2428]. The dependence of dissolution rate on molecular weight and hydrophilic fraction of the polymer has been studied using the new model, as well as the "gel" layer thickness formed during dissolution. The new model predicts available experimental data, and can be a basis for line-edge roughness predictions. en
heal.publisher The Japan society of Applied Physics en
heal.journalName Japanese Journal of Applied Physics en
heal.journalType peer-reviewed
heal.fullTextAvailability false


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Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες Except where otherwise noted, this item's license is described as Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες