A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models

dc.contributor.author	Σαρρής, Β.	el
dc.contributor.author	Πάτσης, Γεώργιος	el
dc.contributor.author	Κωνσταντούδης, Βασίλειος	el
dc.contributor.author	Μπουντούβης, Ανδρέας	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.date.accessioned	2015-05-18T22:14:56Z
dc.date.available	2015-05-18T22:14:56Z
dc.date.issued	2015-05-19
dc.identifier.uri	http://hdl.handle.net/11400/10719
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://iopscience.iop.org	en
dc.source	http://iopscience.iop.org/1347-4065/44/10R/7400?fromSearchPage=true	en
dc.subject	Molecular weight
dc.subject	Μοριακό βάρος
dc.subject	Φωτοαντίσταση
dc.subject	Photoresistance
dc.subject	Polymerization
dc.subject	Πολυμερισμός
dc.title	A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electronics
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρονική
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρονική
heal.identifier.secondary	DOI: 10.1143/JJAP.44.7400
heal.language	en
heal.access	free
heal.publicationDate	2005-10-11
heal.bibliographicCitation	Sarris, V., Patsis, G., Constantoudis, V., Boudouvis, A. and Gogolides, E. (2005) A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models. "Japanese Journal of Applied Physics", 44 (10)	en
heal.tableOfContents	A new model for photoresist-polymer dissolution in aqueous base is presented combining the critical ionization model [P. C. Tsiartas et al.: Macromolecules 30 (1992) 4656] and the percolation model [A. Reiser et al.: Angew. Chem., Int. Ed. 35 (1996) 2428]. The dependence of dissolution rate on molecular weight and hydrophilic fraction of the polymer has been studied using the new model, as well as the "gel" layer thickness formed during dissolution. The new model predicts available experimental data, and can be a basis for line-edge roughness predictions.	en
heal.publisher	The Japan society of Applied Physics	en
heal.journalName	Japanese Journal of Applied Physics	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	false