Thickness determination of thin films based on X-ray signal decay law

dc.contributor.author	Καλτσάς, Γρηγόριος	el
dc.contributor.author	Γλέζος, Νίκος Μ.	el
dc.contributor.author	Βαλαμόντες, Ευάγγελος Σ.	el
dc.contributor.author	Νασιοπούλου, Ανδρούλα Γ.	el
dc.date.accessioned	2015-05-19T09:38:06Z
dc.date.available	2015-05-19T09:38:06Z
dc.date.issued	2015-05-19
dc.identifier.uri	http://hdl.handle.net/11400/10730
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://eu.wiley.com/WileyCDA/	en
dc.subject	Boltzmann transport equation
dc.subject	Electron probe microanalysis
dc.subject	Electron beam lithography
dc.subject	Mathematical models
dc.subject	Λιθογραφία ηλεκτρονικής δέσμης
dc.subject	Μαθηματικά μοντέλα
dc.subject	Boltzmann εξίσωση μεταφοράς
dc.subject	Ηλεκτρονικός ανιχνευστής μικροανάλυσης
dc.title	Thickness determination of thin films based on X-ray signal decay law	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electrical engineering
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρολογία Μηχανολογία
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://zbw.eu/stw/descriptor/18426-4
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρολογία Μηχανολογία
heal.keywordURI	http://id.loc.gov/authorities/subjects/sh85042233
heal.language	en
heal.access	campus
heal.publicationDate	1998-11
heal.bibliographicCitation	KALTSAS, G., GLEZOS, N.M., VALAMONTES, E.S. & NASSIOPOULOU, A.G. (1998). Thickness determination of thin films based on X-ray signal decay law. Surface and Interface Analysis. [online] 26 (12). p. 876-884. Available from: http://eu.wiley.com/WileyCDA/	en
heal.abstract	A non-destructive method for evaluation of the thickness of films over bulk substrates is presented. This method is based on evaluation of the parameters of the decay part of the x-ray signal ratio. For a selected energy range of each film thickness it is demonstrated that the decay part follows an exponential law. The physical parameters involved in this law are the energy exponent and a constant that depends mainly upon the film thickness. The values found for the energy exponent are in the range 2.0-3.0. This is confirmed in a variety of cases (Al/Si, Ti/Si, Cu/Si, Pt/Si, Cu/Ni, Ti/Au and Pt/Au) for film thicknesses larger than a critical value. The experimental results are compared to those obtained by two theoretical methods and a Monte-Carlo approach. The first method is based on solution of the Boltzmann transport equation for the electron beam, an approach developed by one of the authors for e-beam lithography. The second is based on a previously developed semi-empirical formula for the x-ray depth distribution function. The energy dependence of the signal ratio is also discussed using this approach.	en
heal.publisher	Wiley	en
heal.journalName	Surface and Interface Analysis	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true