Monte Carlo calculations of the X-ray induced enhancement signal in electron probe microanalysis (EPMA) and Auger electron spectroscopy (AES) of stratified materials

dc.contributor.author	Νασιοπούλου, Ανδρούλα Γ.	el
dc.contributor.author	Βαλαμόντες, Ευάγγελος Σ.	el
dc.date.accessioned	2015-05-19T10:15:49Z
dc.date.issued	2015-05-19
dc.identifier.uri	http://hdl.handle.net/11400/10734
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://eu.wiley.com/	en
dc.subject	Monte Carlo Methods
dc.subject	Microanalysis
dc.subject	Spectroscopy
dc.subject	Auger Electron
dc.subject	Μόντε Κάρλο Μέθοδοι
dc.subject	Μικροανάλυση
dc.subject	Φασματοσκοπία
dc.subject	Ηλεκτρόνιο Auger
dc.title	Monte Carlo calculations of the X-ray induced enhancement signal in electron probe microanalysis (EPMA) and Auger electron spectroscopy (AES) of stratified materials	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electrical engineering
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρολογία Μηχανολογία
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://zbw.eu/stw/descriptor/18426-4
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρολογία Μηχανολογία
heal.identifier.secondary	DOI: 10.1002/sia.740150703
heal.dateAvailable	10000-01-01
heal.language	en
heal.access	campus
heal.publicationDate	1990-07
heal.bibliographicCitation	NASSIOPOULOU, A.G. & VALAMONTES, E.S. (1990). Monte Carlo calculations of the X-ray induced enhancement signal in electron probe microanalysis (EPMA) and Auger electron spectroscopy (AES) of stratified materials. Surface and Interface Analysis. [online] 15 (7). p. 405-414. Available from: http://eu.wiley.com/	en
heal.abstract	When thin overlayers on a bulk material have to be analysed by EPMA (electron probe microanalysis) or AES (Auger electron spectroscopy), the signal obtained is enhanced by three factors: (i) back-scattering, (ii) characteristic x-rays induced in the bulk by the primary beam and (iii) continuous x-rays (bremsstrahlung) created also in the bulk. The Monte Carlo techniques are applied in order to evaluate the above three enhancement factors when the primary energy is varied in the range 5-50 keV. It is shown that at high primary energies the second and third factors are no longer negligible and become significant in some cases. The approximation to ignore the third factor in EPMA and both the second and third factors in AES is not always valid and introduces an appreciable error. Results are shown for the case of thin films (Al, Au, Cu) on a bulk material (Au, Cu, Si, Ni, Pt).	en
heal.publisher	Wiley	en
heal.journalName	Surface and Interface Analysis	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	false