Effects of model polymer chain architectures of photo-resists on line-edge-roughness

dc.contributor.author	Πάτσης, Γεώργιος	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.date.accessioned	2015-05-19T14:55:42Z
dc.date.available	2015-05-19T14:55:42Z
dc.date.issued	2015-05-19
dc.identifier.uri	http://hdl.handle.net/11400/10737
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://iopscience.iop.org	en
dc.source	http://iopscience.iop.org/1742-6596/10/1/095/	en
dc.subject	LER
dc.subject	Φωτοαντίσταση
dc.subject	Computational physics
dc.subject	Υπολογιστική φυσική
dc.subject	Lithography
dc.title	Effects of model polymer chain architectures of photo-resists on line-edge-roughness	en
heal.type	journalArticle
heal.secondaryTitle	Monte Carlo simulations	en
heal.classification	Technology
heal.classification	Electronics
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρονική
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρονική
heal.identifier.secondary	DOI: 10.1088/1742-6596/10/1/095
heal.language	en
heal.access	campus
heal.publicationDate	2005
heal.bibliographicCitation	Patsis, G. and Gogolides, E. (2005) Effects of model polymer chain architectures of photo-resists on line-edge-roughness: Monte Carlo simulations. "Journal of Physics: Conference Series", 10 (1), p.389-392	en
heal.abstract	Sub-100 nm device fabrication rules require extremely tight control of line-edge roughness (LER) of patterned structures. During lithographic processes the resist film introduces an initial LER due to its chemical structure and processing. This initial LER evolves during the subsequent processing steps. In order to reduce LER the relation between polymer chain geometrical characteristics and finally measured LER has to be determined. Following this approach three model polymer chain architectures were considered and their LER was determined. A direct relation is seen between the measured LER and the excluded volume constraints on the polymer chain.	en
heal.journalName	Journal of Physics: Conference Series	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true