Photoresist line-edge roughness analysis using scaling concepts

dc.contributor.author	Κωνσταντούδης, Βασίλειος	el
dc.contributor.author	Πάτσης, Γεώργιος	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.date.accessioned	2015-05-20T00:10:10Z
dc.date.issued	2015-05-20
dc.identifier.uri	http://hdl.handle.net/11400/10767
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://proceedings.spiedigitallibrary.org	en
dc.source	http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1316836	en
dc.subject	Photoresist materials
dc.subject	Image analysis
dc.subject	Surface roughness
dc.subject	Φωτοαντιστατικά υλικά
dc.subject	Ανάλυση εικόνας
dc.subject	Τραχύτητα εδάφους
dc.subject	LER
dc.title	Photoresist line-edge roughness analysis using scaling concepts	en
heal.type	conferenceItem
heal.classification	Technology
heal.classification	Electronics
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρονική
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρονική
heal.identifier.secondary	DOI: 10.1117/1.1759325
heal.dateAvailable	10000-01-01
heal.language	en
heal.access	forever
heal.publicationDate	2003-02-23
heal.bibliographicCitation	Constantoudis, V., Patsis, G. and Gogolides, E. (2003) Photoresist line-edge roughness analysis using scaling concepts. In Metrology, Inspection, and Process Control for Microlithography XVII. 23rd February 2003. Santa Clara	en
heal.abstract	This paper focuses on the problem of obtaining and characterizing the edge roughness of photoresist lines by analyzing top-down SEM images. AN off-line image analysis algorithm detecting the line edge and an edge roughness characterization scheme, based on scaling analysis, are briefly described. As a result, it is suggested that apart from the rms value of the edge, two more roughness parameters are needed: the roughness exponent α and the correlation length ξ. These characterize the spatial complexity of the edge and determine the dependence of sigma on the length of the measured edge. Completing our previous work on the dependencies of the roughness parameters on various image analysis options, we examine the effect of the type of noise smoothing filter. Then, a comparative study of the roughness parameters of the left and right edges of resist lines is conducted, revealing that the sigma values of the right edges are larger than those of left edges whereas the roughness exponents and the correlation lengths do not show such trend. Finally, the relation between line width roughness and line edge roughness is thoroughly investigated with interesting conclusions.	en
heal.publisher	SPIE	en
heal.fullTextAvailability	false
heal.conferenceName	Metrology, Inspection, and Process Control for Microlithography XVII	en
heal.conferenceItemType	poster