Quantification of line-edge roughness of photoresists

dc.contributor.author	Πάτσης, Γεώργιος	el
dc.contributor.author	Κωνσταντούδης, Βασίλειος	el
dc.contributor.author	Τσερέπη, Αγγελική	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.date.accessioned	2015-05-20T15:17:58Z
dc.date.available	2015-05-20T15:17:58Z
dc.date.issued	2015-05-20
dc.identifier.uri	http://hdl.handle.net/11400/10773
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://scitation.aip.org	en
dc.source	http://scitation.aip.org/content/avs/journal/jvstb/21/3/10.1116/1.1570845	en
dc.subject	Image analysis
dc.subject	Photoresistors
dc.subject	LER
dc.subject	Ανάλυση εικόνας
dc.subject	Φωτοαντιστάσεις
dc.title	Quantification of line-edge roughness of photoresists	en
heal.type	journalArticle
heal.secondaryTitle	i. a comparison between off-line and on-line analysis of top-down scanning electron microscopy images	en
heal.classification	Technology
heal.classification	Electronics
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρονική
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρονική
heal.identifier.secondary	DOI: 10.1116/1.1570845
heal.language	en
heal.access	campus
heal.publicationDate	2003-04-25
heal.bibliographicCitation	Patsis, G., Constantoudis, V., Tserepi, A. and Gogolides, E. (2003) Quantification of line-edge roughness of photoresists. I. A comparison between off-line and on-line analysis of top-down scanning electron microscopy images. "Journal of Vacuum Science & Technology B", 21 (3)	en
heal.abstract	An off-line image analysis algorithm and software is developed for the calculation of line-edge roughness (LER) of resist lines, and is successfully compared with the on-line LER measurements. The effect of several image-processing parameters affecting the fidelity of the off-line LER measurement is examined. The parameters studied include the scanning electron microscopy magnification, the image pixel size dimension, the Gaussian noise-smoothing filter parameters, and the line-edge determination algorithm. The issues of adequate statistics and appropriate sampling frequency are also investigated. The advantages of off-line LER quantification and recommendations for the on-line measurement are discussed. Having introduced a robust algorithm for edge-detection in Paper I, Paper II [V. Constantoudis et al., J. Vac. Sci. Technol. B 21, 1019 (2003)] of this series introduces the appropriate parameters to fully quantify LER.	en
heal.publisher	American Vacuum Society	en
heal.journalName	Journal of Vacuum Science & Technology B	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	false