Quantification of line-edge roughness of photoresists

dc.contributor.author	Κωνσταντούδης, Βασίλειος	el
dc.contributor.author	Πάτσης, Γεώργιος	el
dc.contributor.author	Τσερέπη, Αγγελική	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.date.accessioned	2015-05-20T16:12:40Z
dc.date.available	2015-05-20T16:12:40Z
dc.date.issued	2015-05-20
dc.identifier.uri	http://hdl.handle.net/11400/10778
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://scitation.aip.org	en
dc.source	http://scitation.aip.org/content/avs/journal/jvstb/21/3/10.1116/1.1570844	en
dc.subject	Image analysis
dc.subject	Photoresistors
dc.subject	LER
dc.subject	Ανάλυση εικόνας
dc.subject	Φωτοαντιστάσεις
dc.title	Quantification of line-edge roughness of photoresists	en
heal.type	journalArticle
heal.secondaryTitle	ii. scaling and fractal analysis and the best roughness descriptors	en
heal.classification	Technology
heal.classification	Electronics
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρονική
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρονική
heal.identifier.secondary	DOI: 10.1116/1.1570844
heal.language	en
heal.access	campus
heal.publicationDate	2003-04-25
heal.bibliographicCitation	Constantoudis, V., Patsis, G., Tserepi, A. and Gogolides, E. (2003) Quantification of line-edge roughness of photoresists. II. Scaling and fractal analysis and the best roughness descriptors. "Journal of Vacuum Science & Technology B", 21 (3)	en
heal.abstract	A search for the best and most complete description of line-edge roughness (LER) is presented. The root mean square (rms) value of the edge (sigma value) does not provide a complete characterization of LER since it cannot give information about its spatial complexity. In order to get this missing information, we analyze the detected line edges as found from scanning electron microscope(SEM)image analysis [see Paper I: G. P. Patsis et al., J. Vac. Sci. Technol. B 21, 1008 (2003)] using scaling and fractal concepts. It is shown that the majority of analyzed experimental edges exhibit a self-affine character and thus the suggested parameters for the description of their roughness should be: (1) the sigma value, (2) the correlation length ξ, and (3) the roughness exponent α. The dependencies of ξ and α on various image recording and analysis parameters (magnification, resolution, threshold value, etc.) are thoroughly examined as well as their implications on the calculation of sigma when it is carried out by averaging over the sigmas of a number of segments of the edge. In particular, ξ is shown to be connected to the minimum segment size for which the average sigma becomes independent of the segment size, whereas α seems to be related to the relative contribution of high frequency fluctuations to LER.	en
heal.publisher	American Vacuum Society	en
heal.journalName	Journal of Vacuum Science & Technology B	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	false