Monte Carlo simulation of gel formation and surface and line-edge roughness in negative tone chemically amplified resists

dc.contributor.author	Πάτσης, Γεώργιος	el
dc.contributor.author	Γλέζος, Νίκος	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.date.accessioned	2015-05-20T16:30:53Z
dc.date.available	2015-05-20T16:30:53Z
dc.date.issued	2015-05-20
dc.identifier.uri	http://hdl.handle.net/11400/10781
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://scitation.aip.org	en
dc.source	http://scitation.aip.org/content/avs/journal/jvstb/21/1/10.1116/1.1542616	en
dc.subject	Gels
dc.subject	Rough surfaces
dc.subject	Acids
dc.subject	Computational methods
dc.subject	Diffusion
dc.subject	Τζέλ
dc.subject	Τραχιές επιφάνειες
dc.subject	Οξέα
dc.subject	Υπολογιστικές μέθοδοι
dc.subject	Διάχυση
dc.title	Monte Carlo simulation of gel formation and surface and line-edge roughness in negative tone chemically amplified resists	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electronics
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρονική
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρονική
heal.identifier.secondary	DOI: 10.1116/1.1542616
heal.access	campus
heal.publicationDate	2003-01-23
heal.bibliographicCitation	Patsis, G., Glezos, N. and Gogolides, E. (2003) Monte Carlo simulation of gel formation and surface and line-edge roughness in negative tone chemically amplified resists. "Journal of Vacuum Science & Technology B", 21 (1)	en
heal.abstract	A molecular-based representation of a negative tone chemically amplified resist was developed and studied using stochastic simulations. The gel formation mechanism resulting from the reaction–diffusion phenomena in the polymer matrix during the postexposure bake step, as well as the surface and line-edge roughness formation were investigated in two dimensions. Graph theorycomputational techniques were employed to determine the gel cluster size and its relation to the fraction of the total number of chemically and physically cross-linked chains. Results of the simulation include the maximum aciddiffusion range, the cross-link density, the surface and line edge roughness, versus exposure dose and photoacid generator concentration.	en
heal.publisher	American Vacuum Society	en
heal.journalName	Journal of Vacuum Science & Technology B	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	false