dc.contributor.author | Πάτσης, Γεώργιος | el |
dc.contributor.author | Γογγολίδης, Ευάγγελος | el |
dc.date.accessioned | 2015-05-20T17:01:34Z | |
dc.date.available | 2015-05-20T17:01:34Z | |
dc.date.issued | 2015-05-20 | |
dc.identifier.uri | http://hdl.handle.net/11400/10786 | |
dc.rights | Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
dc.source | http://www.sciencedirect.com | en |
dc.source | http://www.sciencedirect.com/science/article/pii/S0167931701005470 | en |
dc.subject | Surface roughness | |
dc.subject | LER | |
dc.subject | Applied physics | |
dc.subject | Τραχύτητα επιφάνειας | |
dc.subject | Εφαρμοσμένη φυσική | |
dc.subject | Microelectronics | |
dc.subject | Μικροηλεκτρονική | |
dc.title | Simulation of surface and line-edge roughness formation in resists | en |
heal.type | journalArticle | |
heal.classification | Technology | |
heal.classification | Electronics | |
heal.classification | Τεχνολογία | |
heal.classification | Ηλεκτρονική | |
heal.classificationURI | http://id.loc.gov/authorities/subjects/sh85133147 | |
heal.classificationURI | http://id.loc.gov/authorities/subjects/sh85042383 | |
heal.classificationURI | **N/A**-Τεχνολογία | |
heal.classificationURI | **N/A**-Ηλεκτρονική | |
heal.identifier.secondary | DOI: 10.1016/S0167-9317(01)00547-0 | |
heal.language | en | |
heal.access | campus | |
heal.publicationDate | 2001-09 | |
heal.bibliographicCitation | Patsis, G. and Gogolides, E. (2001) Simulation of surface and line-edge roughness formation in resists. "Microelectronic Engineering", 57-58, p.563–569 | en |
heal.abstract | A molecular-type simulation of surface (SR) and line-edge-roughness (LER) is presented and applied to a negative-tone Chemically Amplified Resist (CAR). The simulator can follow the appearance of SR and LER after each process step and predict the roughness dependence on material properties and process conditions. The simulation results are compared with SR experimental data for a negative-tone chemically amplified epoxy resist. | en |
heal.publisher | Elsevier | en |
heal.journalName | Microelectronic Engineering | en |
heal.journalType | peer-reviewed | |
heal.fullTextAvailability | false |
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