Calculation of energy deposition in thin resist films over multilayer substrates

dc.contributor.author	Πάτσης, Γεώργιος	el
dc.contributor.author	Meneghini, Giancarlo	en
dc.contributor.author	Γλέζος, Νίκος	el
dc.contributor.author	Αργείτης, Παναγιώτης	el
dc.date.accessioned	2015-05-20T18:07:04Z
dc.date.available	2015-05-20T18:07:04Z
dc.date.issued	2015-05-20
dc.identifier.uri	http://hdl.handle.net/11400/10793
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.sciencedirect.com	en
dc.source	http://www.sciencedirect.com/science/article/pii/S0167931798000380	en
dc.subject	Multilayer substrates
dc.subject	Πολυστρωματικά υποστρώματα
dc.subject	Electron beams
dc.subject	Lithography
dc.subject	Applied physics
dc.subject	Δέσμες ηλεκτρονίων
dc.subject	Λιθογραφία
dc.subject	Εφαρμοσμένη φυσική
dc.title	Calculation of energy deposition in thin resist films over multilayer substrates	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electronics
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρονική
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρονική
heal.identifier.secondary	DOI: 10.1016/S0167-9317(98)00038-0
heal.language	en
heal.access	free
heal.publicationDate	1998-03
heal.bibliographicCitation	Raptis, I., Glezos, N., Rosenbusch, A., Patsis, G. and Argitis, P. (1998) Calculation of energy deposition in thin resist films over multilayer substrates. "Microelectronic Engineering", 41-42, p.171–174	en
heal.abstract	Multilayer substrates are of great importance for direct write applications. Recently, they are getting more and more importance in mask making as well, for example in the phase shift technology. In the case of direct writing, the substrate consists of various layers of different materials while for mask fabrication, the mask plate consists of at least two different layers, e.g. Cr on glass. A new method for the calculation of energy deposition due to e-beam exposure in thin resist films over composite substrates is presented. The method is based on the solution of the Boltzmann transport equation and has proven to be very fast compared to Monte Carlo method, and its accuracy has been shown by successful comparison with experimental obtained results. The method is incorporated in a complete e-beam lithography simulator.	en
heal.publisher	Elsevier	en
heal.journalName	Microelectronic Engineering	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true