Fractals and device performance variability

dc.contributor.author	Κωνσταντούδης, Βασίλειος	el
dc.contributor.author	Πάτσης, Γεώργιος Π.	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.date.accessioned	2015-05-23T10:18:06Z
dc.date.available	2015-05-23T10:18:06Z
dc.date.issued	2015-05-23
dc.identifier.uri	http://hdl.handle.net/11400/10954
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.sciencedirect.com/science/article/pii/S0167931711004783	en
dc.subject	Device variability
dc.subject	Roughness
dc.subject	Συσκευή μεταβλητότητας
dc.subject	Τραχύτητα
dc.title	Fractals and device performance variability	en
heal.type	journalArticle
heal.secondaryTitle	the key role of roughness in micro and nanofabrication	en
heal.generalDescription	4th International Conference on Micro-Nanoelectronics, Nanotechnologies & MEMs	en
heal.classification	Technology
heal.classification	Electronics
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρονική
heal.classificationURI	http://zbw.eu/stw/descriptor/10470-6
heal.classificationURI	http://zbw.eu/stw/descriptor/10455-2
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρονική
heal.keywordURI	http://lod.nal.usda.gov/58057
heal.identifier.secondary	doi:10.1016/j.mee.2011.04.054
heal.language	en
heal.access	campus
heal.recordProvider	Τ.Ε.Ι. Αθήνας. Σχολή Τεχνολογικών Εφαρμογών. Τμήμα Ηλεκτρονικών Μηχανικών Τ.Ε.	el
heal.publicationDate	2012
heal.bibliographicCitation	Constantoudis, V., Patsis, G. and Gogolides, E. (February 2012). Fractals and device performance variability: the key role of roughness in micro and nanofabrication. Microelectronic Engineering. 90. pp. 121-125. Elsevier B.V: 2012. Available from: http://www.sciencedirect.com/science/article/pii/S0167931711004783 [Accessed 24/04/2011]	en
heal.abstract	Nano and micro-fabrication processes generate patterns with rough surfaces. This roughness becomes a significant fraction of pattern dimensions as feature size scales down and starts to affect surface properties and device performance. It has been shown that in most times surface roughness exhibits scale-limited fractal behavior which is characterized by the fractal dimension. Up to now, fractal dimension has been related to the physicochemical properties of open surfaces. Here, we examine its effects on the performance variability of devices incorporating features with rough surfaces. It is shown that when the feature dimension which is parallel to rough surface becomes lower than about 10 times the surface correlation length then the decrease of rms roughness is followed by an increase in the variability of feature dimension perpendicular to rough surface. Both dependencies are determined by the value of the fractal dimension, which means that fractal dimension controls the impact of roughness on the variability of device dimensions and hence performance. We demonstrate the role of fractal dimension in device variability, by examining the impact of the gate sidewall roughness on the leakage current of planar MOSFET devices.	en
heal.publisher	Elsevier B.V.	en
heal.journalName	Microelectronic Engineering	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true