Novel microfluidic flow sensor based on a microchannel capped by porous silicon

dc.contributor.author	Παγώνης, Δημήτριος-Νικόλαος	el
dc.contributor.author	Πετρόπουλος, Αναστάσιος	el
dc.contributor.author	Καλτσάς, Γρηγόριος	el
dc.contributor.author	Νασσιοπούλου, Ανδρούλα Γ.	el
dc.contributor.author	Τσερέπη, Αγγελική Δ.	el
dc.date.accessioned	2015-05-27T18:50:14Z
dc.date.available	2015-05-27T18:50:14Z
dc.date.issued	2015-05-27
dc.identifier.uri	http://hdl.handle.net/11400/11273
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.wiley-vch.de/	en
dc.subject	Silicon layer
dc.subject	Lithography
dc.subject	Microchannels
dc.subject	Microfluidic flow sensor
dc.subject	Στρώμα πυριτίου
dc.subject	Λιθογραφία
dc.subject	Μικροκανάλια
dc.subject	Μικρορροϊκός αισθητήρας ροής
dc.title	Novel microfluidic flow sensor based on a microchannel capped by porous silicon	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electrical engineering
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρολογία Μηχανολογία
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://zbw.eu/stw/descriptor/18426-4
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρολογία Μηχανολογία
heal.identifier.secondary	DOI: 10.1002/pssa.200674389
heal.language	en
heal.access	campus
heal.publicationDate	2007-05
heal.bibliographicCitation	PAGONIS, D.-N., PETROPOULOS, A., KALTSAS, G., NASSIOPOULOU, A.G. & TSEREPI, A.D. (2007). Novel microfluidic flow sensor based on a microchannel capped by porous silicon. Physica Status Solidi (A). [online] 204 (5). p. 1474-1479. Available from: http://www.wiley-vch.de/[Accessed 02/05/2007]	en
heal.abstract	This work concerns the fabrication, modeling and characterization of a novel microfluidic flow sensor based on a microchannel capped with a porous silicon membrane, on top of which the sensor active elements are integrated. The microchannel is formed through a two-step anodization process. In the first step a mesoporous silicon layer is formed on a lithographically defined area, while in the second step a channel is formed underneath the porous layer by electropolishing. The channel is buried into bulk silicon and capped with a free-standing porous silicon layer, which is co-planar with the Si substrate. The overall developed process for the formation of the device will be described and simulation and device characterization results will be presented.	en
heal.publisher	Wiley-VCH Verlag	en
heal.journalName	Physica Status Solidi (A)	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true