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dc.contributor.author Καλτσάς, Γρηγόριος el
dc.contributor.author Νασιοπούλου, Ανδρούλα Γ. el
dc.date.accessioned 2015-06-02T15:05:12Z
dc.date.available 2015-06-02T15:05:12Z
dc.date.issued 2015-06-02
dc.identifier.uri http://hdl.handle.net/11400/14865
dc.rights Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.source http://www.elsevier.com/ en
dc.subject CMOS integrated circuits
dc.subject Lithography
dc.subject Porous silicon
dc.subject CMOS ολοκληρωμένα κυκλώματα
dc.subject λιθογραφία
dc.subject πορώδες πυρίτιο
dc.title Bulk silicon micromachining using porous silicon sacrificial layers en
heal.type journalArticle
heal.classification Science
heal.classification Physics
heal.classification Επιστήμη
heal.classification Φυσική
heal.classificationURI http://zbw.eu/stw/descriptor/15685-2
heal.classificationURI http://zbw.eu/stw/descriptor/15669-0
heal.classificationURI **N/A**-Επιστήμη
heal.classificationURI **N/A**-Φυσική
heal.identifier.secondary DOI: 10.1016/S0167-9317(96)00209-2
heal.language en
heal.access campus
heal.publicationDate 1997-02
heal.bibliographicCitation KALTSAS, G. & NASSIOPOULOU, A.G. (1997). Bulk silicon micromachining using porous silicon sacrificial layers. Microelectronic Engineering. [online] 35 (1-4). p. 397-400. Available from: http://www.elsevier.com/ en
heal.abstract A bulk silicon micromachining technique using porous silicon as a sacrificial layer is developed. The proposed process is fully C-MOS compatible and it was successfully used to fabricate deep cavities into silicon with very smooth bottom surfaces and sidewalls. Suspended flat polysilicon membranes were also produced of a surface as large as 230 × 550 μm2, as well as polysilicon cantilevers. This process opens important possibilities in silicon integrated sensor fabrication. en
heal.publisher Elsevier en
heal.journalName Microelectronic Engineering en
heal.journalType peer-reviewed
heal.fullTextAvailability true


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Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες Except where otherwise noted, this item's license is described as Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες