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dc.contributor.author Κωνσταντούδης, Βασίλειος el
dc.contributor.author Γογγολίδης, Ευάγγελος el
dc.contributor.author Πάτσης, Γεώργιος Π. el
dc.date.accessioned 2015-06-07T19:43:19Z
dc.date.issued 2015-06-07
dc.identifier.uri http://hdl.handle.net/11400/15540
dc.rights Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.source http://www.elsevier.com/ en
dc.subject Critical dimension uniformity (CDU)
dc.subject Line edge roughness (LER)
dc.subject Line width roughness (LWR)
dc.subject Κρίσιμη διάσταση ομοιομορφίας
dc.subject Πλάτος της γραμμής τραχύτητας
dc.title Sidewall roughness in nanolithography en
heal.type journalArticle
heal.secondaryTitle origins, metrology and device effects en
heal.classification Technology
heal.classification Engineering
heal.classification Τεχνολογία
heal.classification Μηχανική
heal.classificationURI http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI http://zbw.eu/stw/descriptor/19795-3
heal.classificationURI **N/A**-Τεχνολογία
heal.classificationURI **N/A**-Μηχανική
heal.identifier.secondary DOI: 10.1533/9780857098757.503
heal.dateAvailable 10000-01-01
heal.language en
heal.access forever
heal.publicationDate 2013-11
heal.bibliographicCitation CONSTANTOUDIS, V., GOGOLIDES, E. & PATSIS, G.P. (2013). Sidewall roughness in nanolithography: origins, metrology and device effects. Nanolithography: The Art of Fabricating Nanoelectronic and Nanophotonic Devices and Systems. [online]. p. 503-537. Available from: http://www.elsevier.com/[Accessed 21/02/2014] en
heal.abstract One of the great challenges in next generation lithography is to print linear features with controllable sidewall roughness, which is usually called line edge/line width roughness (LER/LWR). The aim of this chapter is to provide an interdisciplinary approach to LER/LWR covering all related aspects. To this end, after a short introduction to LER/LWR concepts, it reports the basic findings of recent intensive research concerning the metrology and characterization, the material and process origins, and the device effects of LER/LWR. Both simulation and experimental results are presented, and emphasis is given to their comparison. en
heal.publisher Elsevier en
heal.journalName Nanolithography: The Art of Fabricating Nanoelectronic and Nanophotonic Devices and Systems en
heal.journalType peer-reviewed
heal.fullTextAvailability false


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Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες Except where otherwise noted, this item's license is described as Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες