Sidewall roughness in nanolithography

dc.contributor.author	Κωνσταντούδης, Βασίλειος	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.contributor.author	Πάτσης, Γεώργιος Π.	el
dc.date.accessioned	2015-06-07T19:43:19Z
dc.date.issued	2015-06-07
dc.identifier.uri	http://hdl.handle.net/11400/15540
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.elsevier.com/	en
dc.subject	Critical dimension uniformity (CDU)
dc.subject	Line edge roughness (LER)
dc.subject	Line width roughness (LWR)
dc.subject	Κρίσιμη διάσταση ομοιομορφίας
dc.subject	Πλάτος της γραμμής τραχύτητας
dc.title	Sidewall roughness in nanolithography	en
heal.type	journalArticle
heal.secondaryTitle	origins, metrology and device effects	en
heal.classification	Technology
heal.classification	Engineering
heal.classification	Τεχνολογία
heal.classification	Μηχανική
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://zbw.eu/stw/descriptor/19795-3
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Μηχανική
heal.identifier.secondary	DOI: 10.1533/9780857098757.503
heal.dateAvailable	10000-01-01
heal.language	en
heal.access	forever
heal.publicationDate	2013-11
heal.bibliographicCitation	CONSTANTOUDIS, V., GOGOLIDES, E. & PATSIS, G.P. (2013). Sidewall roughness in nanolithography: origins, metrology and device effects. Nanolithography: The Art of Fabricating Nanoelectronic and Nanophotonic Devices and Systems. [online]. p. 503-537. Available from: http://www.elsevier.com/[Accessed 21/02/2014]	en
heal.abstract	One of the great challenges in next generation lithography is to print linear features with controllable sidewall roughness, which is usually called line edge/line width roughness (LER/LWR). The aim of this chapter is to provide an interdisciplinary approach to LER/LWR covering all related aspects. To this end, after a short introduction to LER/LWR concepts, it reports the basic findings of recent intensive research concerning the metrology and characterization, the material and process origins, and the device effects of LER/LWR. Both simulation and experimental results are presented, and emphasis is given to their comparison.	en
heal.publisher	Elsevier	en
heal.journalName	Nanolithography: The Art of Fabricating Nanoelectronic and Nanophotonic Devices and Systems	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	false