Proton beam micromachining on strippable aqueous base developable negative resist

dc.contributor.author	Rajta, István	en
dc.contributor.author	Baradács, E.	en
dc.contributor.author	Χατζηχρηστίδη, Μαργαρίτα	el
dc.contributor.author	Βαλαμόντες, Ευάγγελος Σ.	el
dc.contributor.author	Uzonyi, I.	en
dc.date.accessioned	2015-06-12T07:17:55Z
dc.date.available	2015-06-12T07:17:55Z
dc.date.issued	2015-06-12
dc.identifier.uri	http://hdl.handle.net/11400/15790
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.sciencedirect.com/science/article/pii/S0168583X0500114X?np=y#	el
dc.subject	Proton beam micromachining
dc.subject	Proton Μικρομηχανική ακτίνα
dc.subject	High aspect ratio technologies
dc.subject	Υψηλή αναλογία τεχνολογιών
dc.subject	Epoxy and polystyrene based chemically amplified polymer resists
dc.title	Proton beam micromachining on strippable aqueous base developable negative resist	en
heal.type	journalArticle
heal.classification	Electrical engineering
heal.classification	Physics
heal.classification	Ηλεκτρολογική μηχανική
heal.classification	Φυσική
heal.classificationURI	http://skos.um.es/unescothes/C01311
heal.classificationURI	http://skos.um.es/unescothes/C02994
heal.classificationURI	N/A-Ηλεκτρολογική μηχανική
heal.classificationURI	N/A-Φυσική
heal.contributorName	Ράπτης, Ιωάννης	el
heal.identifier.secondary	doi:10.1016/j.nimb.2005.01.094
heal.language	en
heal.access	campus
heal.publicationDate	2005-04
heal.bibliographicCitation	Rajta, I., Baradács, E., Chatzichristidi, M., Valamontes, E., Uzonyi, I., et.al. (2005). Proton beam micromachining on strippable aqueous base developable negative resist. "Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms", 231(1-4), April 2005. pp. 423-427. Available from: http://www.sciencedirect.com/science/article/pii/S0168583X0500114X?np=y#. [Accessed 17/03/2005]	en
heal.abstract	Nowadays a significant amount of research effort is devoted to the development of technologies for the fabrication of microcomponents and microsystems worldwide. In certain applications of micromachining high aspect ratio (HAR) structures are required. However, the resist materials used in HAR technologies are usually not compatible with the IC fabrication, either because they cannot be stripped away or because they are developed in organic solvents. In the present work the application of a novel chemically amplified resist for proton beam micromachining is presented. The resist based on epoxy and polyhydroxystyrene polymers is developed in the IC standard aqueous developers. The exposed areas can be stripped away using conventional organic stripping solutions. In order to test the exposure dose sensitivity and the lateral resolution, various test structures were irradiated. Using this formulation 5–8 μm wide lines with aspect ratio 4–6 were resolved.	en
heal.journalName	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true