Electron beam lithography on multilayer substrates

dc.contributor.author	Ράπτης, Ιωάννης Α.	el
dc.contributor.author	Meneghini, Giancarlo	el
dc.contributor.author	Rosenbusch, Anja	el
dc.contributor.author	Γλέζος, Νίκος Μ.	el
dc.contributor.author	Palumbo, Rafaelle	el
dc.date.accessioned	2015-06-23T10:35:31Z
dc.date.issued	2015-06-23
dc.identifier.uri	http://hdl.handle.net/11400/17762
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://spie.org/	el
dc.title	Electron beam lithography on multilayer substrates	el
heal.type	conferenceItem
heal.secondaryTitle	experimental and theoretical study	el
heal.classification	Technology
heal.classification	Electrical engineering
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρολογία Μηχανολογία
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://zbw.eu/stw/descriptor/18426-4
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρολογία Μηχανολογία
heal.dateAvailable	10000-01-01
heal.access	forever
heal.fullTextAvailability	false
heal.conferenceName	Emerging Lithographic Technologies II	el
heal.conferenceItemType	poster

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