Sidewall roughness in nanolithography

dc.contributor.author	Κωνσταντούδης, Βασίλειος	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.contributor.author	Πάτσης, Γεώργιος Π.	el
dc.date.accessioned	2015-06-25T07:42:26Z
dc.date.issued	2015-06-25
dc.identifier.uri	http://hdl.handle.net/11400/18408
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.title	Sidewall roughness in nanolithography	el
heal.type	journalArticle
heal.secondaryTitle	origins, metrology and device effects	el
heal.classification	Technology
heal.classification	Engineering
heal.classification	Τεχνολογία
heal.classification	Μηχανική
heal.classificationURI	N/A-Technology
heal.classificationURI	N/A-Engineering
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Μηχανική
heal.dateAvailable	10000-01-01
heal.access	forever
heal.journalName	Nanolithography: The Art of Fabricating Nanoelectronic and Nanophotonic Devices and Systems	el
heal.journalType	peer-reviewed
heal.fullTextAvailability	false

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