Realization and simulation of high aspect ratio micro/nano structures by proton beam writing

dc.contributor.author	Χατζηχρηστίδη, Μαργαρίτα	el
dc.contributor.author	Βαλαμόντες, Ευάγγελος Σ.	el
dc.contributor.author	Ράπτης, Ιωάννης Α.	el
dc.contributor.author	Van Kan, Jeroen Anton	en
dc.contributor.author	Watt, Frank R.	en
dc.date.accessioned	2015-05-17T19:42:02Z
dc.date.issued	2015-05-17
dc.identifier.uri	http://hdl.handle.net/11400/10623
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://ieeexplore.ieee.org/	en
dc.subject	Electroplating
dc.subject	Fluid mechanics
dc.subject	Optimization
dc.subject	Photoresistors
dc.subject	Pressure drop
dc.subject	Structural optimization
dc.subject	Φωτοαντιστάσεις
dc.subject	Ηλεκτρολυτική
dc.subject	Μηχανική ρευστών
dc.subject	Βελτιστοποίηση
dc.subject	Πτώση πίεσης
dc.subject	Διαρθρωτική βελτιστοποίηση
dc.title	Realization and simulation of high aspect ratio micro/nano structures by proton beam writing	en
heal.type	conferenceItem
heal.classification	Technology
heal.classification	Electrical engineering
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρολογία Μηχανολογία
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://zbw.eu/stw/descriptor/18426-4
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρολογία Μηχανολογία
heal.keywordURI	http://skos.um.es/unesco6/330310
heal.keywordURI	http://id.loc.gov/authorities/subjects/sh85049383
heal.keywordURI	http://id.loc.gov/authorities/subjects/sh85101408
heal.keywordURI	http://id.loc.gov/authorities/subjects/sh88004614
heal.identifier.secondary	DOI: 10.1109/IMNC.2007.4456283
heal.dateAvailable	10000-01-01
heal.language	en
heal.access	forever
heal.publicationDate	2007
heal.bibliographicCitation	Chatzichristidi, M., Valamontes, E.S., Raptis, I.A., Van Kan, J.-A. & Watt, F.R. (2007) Realization and simulation of high aspect ratio micro/nano structures by proton beam writing, In: Proceedings of the 20th International Microprocesses and Nanotechnology Conference, MNC 2007. Kyoto, Japan. 5-8 November, 2007. [online]. p. 420-421, 4456283. Available from: http://ieeexplore.ieee.org/	en
heal.abstract	In this paper, proton beam writing is combined with an aqueous developable-easily stripped negative chemically amplified resist (TADEP: thick aqueous developable epoxy resist) for the realization of high aspect ratio structures. Monte Carlo method is used to simulate PBW in thick resist films. Result shows that resist structures with 280 nm linewidth and aspect ratio of 40 were easily resolved.	en
heal.publisher	IEEE	en
heal.fullTextAvailability	false
heal.conferenceName	20th International Microprocesses and Nanotechnology Conference, MNC 2007	en
heal.conferenceItemType	poster