Characterization and simulation of surface and line-edge roughness in photoresists

dc.contributor.author	Κωνσταντούδης, Βασίλειος	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.contributor.author	Πάτσης, Γεώργιος Π.	el
dc.contributor.author	Τσερέπη, Αγγελική Δ.	el
dc.contributor.author	Βαλαμόντες, Ευάγγελος Σ.	el
dc.date.accessioned	2015-05-19T07:33:41Z
dc.date.available	2015-05-19T07:33:41Z
dc.date.issued	2015-05-19
dc.identifier.uri	http://hdl.handle.net/11400/10723
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.aip.org/	en
dc.subject	Fractal dimension
dc.subject	Line-edge roughness
dc.subject	Molecular type simulator
dc.subject	Negative tone epoxy resists
dc.subject	Photoacid generator concentration
dc.subject	Root mean square deviation
dc.subject	Απόκλιση μέσης τετραγωνικής ρίζας
dc.subject	Γεννήτρια συγκέντρωσης φωτοξέων
dc.subject	Fractal διάσταση
dc.subject	Προσομοιωτής μοριακού τύπου
dc.title	Characterization and simulation of surface and line-edge roughness in photoresists	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electrical engineering
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρολογία Μηχανολογία
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://zbw.eu/stw/descriptor/18426-4
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρολογία Μηχανολογία
heal.identifier.secondary	DOI: 10.1116/1.1420582
heal.language	en
heal.access	campus
heal.publicationDate	2001-11
heal.bibliographicCitation	CONSTANTINOUDIS, V., GOGOLIDES, E., PATSIS, G.P., TSEREPI, A.D. & VALAMONTES, E.S. (2001). Characterization and simulation of surface and line-edge roughness in photoresists. Journal of Vacuum Science and Technology B. [online] 19 (6). p. 2694-2698. Available from: http://www.aip.org/	en
heal.abstract	An overview is given on the problem of roughness in photoresists. Focus is on the inspection of three relevant aspects: quantitative characterization, dependence on some material properties and process conditions, and molecular simulations.	en
heal.publisher	American Institute of Physics	en
heal.journalName	Journal of Vacuum Science and Technology B	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true