dc.contributor.author | Πάτσης, Γεώργιος Π. | el |
dc.contributor.author | Τσερέπη, Αγγελική Δ. | el |
dc.contributor.author | Ράπτης, Ιωάννης Α. | el |
dc.contributor.author | Γλέζος, Νίκος Μ. | el |
dc.contributor.author | Γογγολίδης, Ευάγγελος | el |
dc.date.accessioned | 2015-05-19T08:58:19Z | |
dc.date.available | 2015-05-19T08:58:19Z | |
dc.date.issued | 2015-05-19 | |
dc.identifier.uri | http://hdl.handle.net/11400/10727 | |
dc.rights | Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
dc.source | http://www.aip.org/ | en |
dc.subject | Antireflection coatings | |
dc.subject | Computer simulation | |
dc.subject | Microelectronics | |
dc.subject | Microstructure | |
dc.subject | Plasmas | |
dc.subject | Surface roughness | |
dc.subject | Επιφανειακή τραχύτητα | |
dc.subject | Πλάσμα | |
dc.subject | Μικροδομή | |
dc.subject | Μικροηλεκτρονική | |
dc.subject | Υπολογιστική προσομοίωση | |
dc.subject | Αντιανακλαστικές επιστρώσεις | |
dc.title | Surface and line-edge roughness in solution and plasma developed negative tone resists | en |
heal.type | journalArticle | |
heal.secondaryTitle | experiment and simulation | en |
heal.generalDescription | 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication. Rancho Mirage, CA, USA. 30 May - 2 June, 2000. Code 57844 | en |
heal.classification | Technology | |
heal.classification | Electrical engineering | |
heal.classification | Τεχνολογία | |
heal.classification | Ηλεκτρολογία Μηχανολογία | |
heal.classificationURI | http://id.loc.gov/authorities/subjects/sh85133147 | |
heal.classificationURI | http://zbw.eu/stw/descriptor/18426-4 | |
heal.classificationURI | **N/A**-Τεχνολογία | |
heal.classificationURI | **N/A**-Ηλεκτρολογία Μηχανολογία | |
heal.keywordURI | http://id.loc.gov/authorities/subjects/sh85029533 | |
heal.keywordURI | http://id.loc.gov/authorities/subjects/sh85084822 | |
heal.keywordURI | http://id.loc.gov/authorities/subjects/sh2004006344 | |
heal.keywordURI | http://id.loc.gov/authorities/subjects/sh85130724 | |
heal.contributorName | Βαλαμόντες, Ευάγγελος Σ. | el |
heal.identifier.secondary | DOI: 10.1116/1.1321281 | |
heal.language | en | |
heal.access | campus | |
heal.publicationDate | 2000-11 | |
heal.bibliographicCitation | PATSIS, G.P., TSEREPI, A.D., RAPTIS, I.A., GLEZOS, N.M., GOGOLIDES,E., et al. (2000). Surface and line-edge roughness in solution and plasma developed negative tone resists: experiment and simulation. Journal of Vacuum Science and Technology B. [online] 18 (6). p. 3292-3296. Available from: http://www.aip.org/ | en |
heal.abstract | A framework for the study of surface roughness and line-edge roughness was presented. Experimental results from siloxane resists showed that such systems had the potential of very low surface roughness. A description of surface roughness and line-edge roughness simulation was also given. It was possible to simulate the change of roughness with dose, development time, acid diffusion length, PAG concentration, and polymer structure. | en |
heal.publisher | American Institute of Physics | en |
heal.journalName | Journal of Vacuum Science and Technology B | en |
heal.journalType | peer-reviewed | |
heal.fullTextAvailability | true |
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