Surface and line-edge roughness in solution and plasma developed negative tone resists

dc.contributor.author	Πάτσης, Γεώργιος Π.	el
dc.contributor.author	Τσερέπη, Αγγελική Δ.	el
dc.contributor.author	Ράπτης, Ιωάννης Α.	el
dc.contributor.author	Γλέζος, Νίκος Μ.	el
dc.contributor.author	Γογγολίδης, Ευάγγελος	el
dc.date.accessioned	2015-05-19T08:58:19Z
dc.date.available	2015-05-19T08:58:19Z
dc.date.issued	2015-05-19
dc.identifier.uri	http://hdl.handle.net/11400/10727
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.aip.org/	en
dc.subject	Antireflection coatings
dc.subject	Computer simulation
dc.subject	Microelectronics
dc.subject	Microstructure
dc.subject	Plasmas
dc.subject	Surface roughness
dc.subject	Επιφανειακή τραχύτητα
dc.subject	Πλάσμα
dc.subject	Μικροδομή
dc.subject	Μικροηλεκτρονική
dc.subject	Υπολογιστική προσομοίωση
dc.subject	Αντιανακλαστικές επιστρώσεις
dc.title	Surface and line-edge roughness in solution and plasma developed negative tone resists	en
heal.type	journalArticle
heal.secondaryTitle	experiment and simulation	en
heal.generalDescription	44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication. Rancho Mirage, CA, USA. 30 May - 2 June, 2000. Code 57844	en
heal.classification	Technology
heal.classification	Electrical engineering
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρολογία Μηχανολογία
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://zbw.eu/stw/descriptor/18426-4
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρολογία Μηχανολογία
heal.keywordURI	http://id.loc.gov/authorities/subjects/sh85029533
heal.keywordURI	http://id.loc.gov/authorities/subjects/sh85084822
heal.keywordURI	http://id.loc.gov/authorities/subjects/sh2004006344
heal.keywordURI	http://id.loc.gov/authorities/subjects/sh85130724
heal.contributorName	Βαλαμόντες, Ευάγγελος Σ.	el
heal.identifier.secondary	DOI: 10.1116/1.1321281
heal.language	en
heal.access	campus
heal.publicationDate	2000-11
heal.bibliographicCitation	PATSIS, G.P., TSEREPI, A.D., RAPTIS, I.A., GLEZOS, N.M., GOGOLIDES,E., et al. (2000). Surface and line-edge roughness in solution and plasma developed negative tone resists: experiment and simulation. Journal of Vacuum Science and Technology B. [online] 18 (6). p. 3292-3296. Available from: http://www.aip.org/	en
heal.abstract	A framework for the study of surface roughness and line-edge roughness was presented. Experimental results from siloxane resists showed that such systems had the potential of very low surface roughness. A description of surface roughness and line-edge roughness simulation was also given. It was possible to simulate the change of roughness with dose, development time, acid diffusion length, PAG concentration, and polymer structure.	en
heal.publisher	American Institute of Physics	en
heal.journalName	Journal of Vacuum Science and Technology B	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	true