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dc.contributor.author Leunissen, L. H. A. el
dc.contributor.author Ercken, Monique el
dc.contributor.author Πάτσης, Γεώργιος el
dc.date.accessioned 2015-05-19T14:39:54Z
dc.date.available 2015-05-19T14:39:54Z
dc.date.issued 2015-05-19
dc.identifier.uri http://hdl.handle.net/11400/10736
dc.rights Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.source http://www.sciencedirect.com en
dc.source http://www.sciencedirect.com/science/article/pii/S0167931704005398 en
dc.subject LER
dc.subject Στατιστικές διακυμάνσεις
dc.subject Electron beam lithography
dc.subject Λιθογραφία δέσμης ηλεκτρονίων
dc.title Determining the impact of statistical fluctuations on resist line edge roughness en
heal.type journalArticle
heal.classification Technology
heal.classification Electronics
heal.classification Τεχνολογία
heal.classification Ηλεκτρονική
heal.classificationURI http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI **N/A**-Τεχνολογία
heal.classificationURI **N/A**-Ηλεκτρονική
heal.identifier.secondary DOI: 10.1016/j.mee.2004.12.005
heal.language en
heal.access campus
heal.publicationDate 2005-03
heal.bibliographicCitation Leunissen, L.H.A., Ercken, M. and Patsis, G. (2005) Determining the impact of statistical fluctuations on resist line edge roughness. "Microelectronic Engineering", 78-79, p.2–10 en
heal.abstract Line edge roughness of chemically amplified resists depends on many parameters. In a practical situation, all settings are chosen to be at their optimum, giving the smallest LER. Starting from this situation, the trade-off between four important parameters (shot noise, secondary electron drift, resist polymer size and post-exposure bake diffusion), is investigated in this paper. en
heal.publisher Elsevier en
heal.journalName Microelectronic Engineering en
heal.journalType peer-reviewed
heal.fullTextAvailability false


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Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες Except where otherwise noted, this item's license is described as Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες