Determining the impact of statistical fluctuations on resist line edge roughness

dc.contributor.author	Leunissen, L. H. A.	el
dc.contributor.author	Ercken, Monique	el
dc.contributor.author	Πάτσης, Γεώργιος	el
dc.date.accessioned	2015-05-19T14:39:54Z
dc.date.available	2015-05-19T14:39:54Z
dc.date.issued	2015-05-19
dc.identifier.uri	http://hdl.handle.net/11400/10736
dc.rights	Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.source	http://www.sciencedirect.com	en
dc.source	http://www.sciencedirect.com/science/article/pii/S0167931704005398	en
dc.subject	LER
dc.subject	Στατιστικές διακυμάνσεις
dc.subject	Electron beam lithography
dc.subject	Λιθογραφία δέσμης ηλεκτρονίων
dc.title	Determining the impact of statistical fluctuations on resist line edge roughness	en
heal.type	journalArticle
heal.classification	Technology
heal.classification	Electronics
heal.classification	Τεχνολογία
heal.classification	Ηλεκτρονική
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85133147
heal.classificationURI	http://id.loc.gov/authorities/subjects/sh85042383
heal.classificationURI	N/A-Τεχνολογία
heal.classificationURI	N/A-Ηλεκτρονική
heal.identifier.secondary	DOI: 10.1016/j.mee.2004.12.005
heal.language	en
heal.access	campus
heal.publicationDate	2005-03
heal.bibliographicCitation	Leunissen, L.H.A., Ercken, M. and Patsis, G. (2005) Determining the impact of statistical fluctuations on resist line edge roughness. "Microelectronic Engineering", 78-79, p.2–10	en
heal.abstract	Line edge roughness of chemically amplified resists depends on many parameters. In a practical situation, all settings are chosen to be at their optimum, giving the smallest LER. Starting from this situation, the trade-off between four important parameters (shot noise, secondary electron drift, resist polymer size and post-exposure bake diffusion), is investigated in this paper.	en
heal.publisher	Elsevier	en
heal.journalName	Microelectronic Engineering	en
heal.journalType	peer-reviewed
heal.fullTextAvailability	false